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Reflective mask blank for exposure, reflective mask for exposure, method of producing a semiconductor device, and substrate provided with multilayer reflective film
Reflective mask blank for exposure, reflective mask for exposure, method of producing a semiconductor device, and substrate provided with multilayer reflective film
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机译:用于曝光的反射掩模坯料,用于曝光的反射掩模,半导体器件的制造方法以及具有多层反射膜的基板
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摘要
To provide a reflective mask blank for exposure that can solve a problem of adsorption failure in fixing a reflective mask using an electrostatic chuck and thus can flatten the surface of the mask using the electrostatic chuck, thereby realizing high-accuracy pattern transfer. In a reflective mask blank for exposure having a multilayer reflective film formed on a board and adapted to reflect exposure light and an absorbent layer formed on the multilayer reflective film and adapted to absorb the exposure light, the shape of a surface of the mask blank on its side opposite to its transfer pattern forming surface is a shape having a convex surface.
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