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Mura defect inspection mask, apparatus and method of inspecting the mura defect, and method of producing a photomask
Mura defect inspection mask, apparatus and method of inspecting the mura defect, and method of producing a photomask
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机译:Mura缺陷检查掩模,检查Mura缺陷的设备和方法以及制造光掩模的方法
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摘要
Plural repetitive patterns 61 are formed on a transparent substrate 62 in the unit of a chip 65. Each of the repetitive patterns has plural pseudo mura defects 66 to which intensities of mura defects occurring in a predetermined repetitive pattern are allocated with being stepwise changed, for respective kinds of the mura defects.;The mura defects are a CD Mura based on an abnormality in critical dimension of unit patterns 63 in the repetitive patterns, a Pitch Mura based on an abnormality in interval of the repetitive patterns, a Butting Mura based on a positional displacement of the repetitive patterns, and a Defect mura based on a pattern defect of unit patterns in the repetitive patterns.
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