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Method of forming a low temperature-grown buffer layer, a light emitting element and method of making same, and light emitting device

机译:形成低温生长的缓冲层的方法,发光元件及其制造方法以及发光装置

摘要

A method of forming a low temperature-grown buffer layer having the steps of: placing a Ga2O3 substrate in a MOCVD apparatus; providing a H2 atmosphere in the MOCVD apparatus and setting a buffer layer growth condition having an atmosphere temperature of 350° C. to 550° C.; and supplying a source gas having two or more of TMG, TMA and NH3 onto the Ga2O3 substrate in the buffer layer growth condition to form the low temperature-grown buffer layer on the Ga2O3 substrate.
机译:一种形成低温生长的缓冲层的方法,该方法具有以下步骤:将Ga 2 O 3 衬底放置在MOCVD装置中;在MOCVD装置中提供H 2 气氛,并设置气氛温度为350℃至550℃的缓冲层生长条件;并在缓冲层生长条件下向Ga 2 O 3 衬底上提供具有TMG,TMA和NH 3 中的两种或更多种的源气体在Ga 2 O 3 衬底上形成低温生长的缓冲层。

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