首页> 外国专利> AlxInyGa1-x-yN mixture crystal substrate, method of growing AlxInyGa1-x-yN mixture crystal substrate and method of producing AlxInyGa1-x-yN mixture crystal substrate

AlxInyGa1-x-yN mixture crystal substrate, method of growing AlxInyGa1-x-yN mixture crystal substrate and method of producing AlxInyGa1-x-yN mixture crystal substrate

机译:Al x In y Ga 1-xy N混合晶体衬底,Al x In 的生长方法y Ga 1-xy N混合晶体衬底及制备Al x In y Ga 1-xy <的方法/ Sub> N混合晶体基板

摘要

A low dislocation density AlxInyGa1-x-yN single crystal substrate is made by forming a seed mask having parallel stripes regularly and periodically aligning on an undersubstrate, growing an AlxInyGa1-x-yN crystal on a facet-growth condition, forming repetitions of parallel facet hills and facet valleys rooted upon the mask stripes, maintaining the facet hills and facet valleys, producing voluminous defect accumulating regions (H) accompanying the valleys, yielding low dislocation single crystal regions (Z) following the facets, making C-plane growth regions (Y) following flat tops between the facets, gathering dislocations on the facets into the valleys by the action of the growing facets, reducing dislocations in the low dislocation single crystal regions (Z) and the C-plane growth regions (Y), and accumulating the dislocations in cores (S) or interfaces (K) of the voluminous defect accumulating regions (H).
机译:通过规则且周期性地形成具有平行条纹的籽晶掩模来制造低位错密度的Al x In y Ga 1-xy N单晶衬底在下基板上对齐,在刻面生长条件下生长Al x In y Ga 1-xy N晶体,形成平行小平面的重复丘陵和刻面山谷扎根在掩模条纹上,维持刻面丘陵和刻面山谷,伴随山谷形成大量的缺陷累积区(H),在刻面之后产生低位错单晶区(Z),从而形成C平面生长区Y)跟随小平面之间的平坦顶部,通过生长小平面的作用将小平面上的位错聚集到山谷中,减少低位错单晶区(Z)和C平面生长区(Y)中的位错,并累积大量缺陷累积区域(H)的核(S)或界面(K)中的位错。

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