CHEMICAL MECHANICAL POLISHING PAD STRUCTURE MINIMIZING TRAPPED AIR AND POLISHING FLUID INTRUSION

摘要

A polishing pad (5) is attachable to a platen (20) to minimize trapped air and polishing fluid intrusion. The pad comprises a polishing layer (12) having a polishing surface on a first end of the pad and a polishing layer peripheral edge extending away front the polishing surface,- a gas impermeable attaching layer (18) defines an attachment surface for securing the pad to the platen at an opposed second end of the pad, the attaching layer having an attaching layer peripheral edge extending away from the attachment surface, wherein a peripheral edge of the pad extends from the polishing surface to the attaching surface formed of the peripheral edges of each pad layer; and a.plurality of openings (22) extending through the attaching layer. During pad attachment, trapped air flows through the attaching layer openings and out of the peripheral edge of the pad at a position 'spaced from the attaching layer peripheral edge.