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METHOD FOR CONTROLLING PLASMA DENSITY DISTRIBUTION IN PLASMA CHAMBER
METHOD FOR CONTROLLING PLASMA DENSITY DISTRIBUTION IN PLASMA CHAMBER
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机译:等离子体室中等离子体密度分布的控制方法
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摘要
A method for controlling plasma density distribution in a plasma chamber in order to control a critical dimension (CD) and obtain uniformity of an etching rate. The plasma density distribution control method is used to fabricate a semiconductor device in the plasma chamber and comprises the steps of establishing an intended plasma density distribution in the plasma chamber and controlling a voltage distribution in the plasma chamber with relation to the established plasma density distribution.
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