The spatial distribution of Electron Cyclotron Resonance (ECR) plasma in the ECRPlasma Enhanced Metalorganic Chemical Vapour Deposition (ECR-PECVD) reaction chamber is diagnosed by a Langmuir probe. The uniformity is also investigated. The results show that the ECR plasma in the upper region of the reaction chamber under the influence of magnetic field has poor radial and axial uniformity. However, the plasma in the downstream region of the reaction chamber has fine radial uniformity. This excellent uniform plasma in the downstream has extensive application in plasma process.
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