首页> 外文期刊>Plasma Science & Technology >Spatial Distribution of ECR Plasma Density in ECR-PECVD Reaction Chamber
【24h】

Spatial Distribution of ECR Plasma Density in ECR-PECVD Reaction Chamber

机译:ECR-PECVD反应室内ECR等离子体密度的空间分布

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

The spatial distribution of Electron Cyclotron Resonance (ECR) plasma in the ECR-Plasma Enhanced Metalorganic Chemical Vapour Deposition (ECR-PECVD) reaction chamber is diagnosed by a Langmuir probe. The uniformity is also investigated. The results show that the ECR plasma in the upper region of the reaction chamber under the influence of magnetic field has poor radial and axial uniformity. However, the plasma in the downstream region of the reaction chamber has fine radial uniformity. This excellent uniform plasma in the downstream has extensive application in plasma process.
机译:通过Langmuir探针诊断ECR-等离子体增强金属有机化学气相沉积(ECR-PECVD)反应室中电子回旋共振(ECR)等离子体的空间分布。还研究了均匀性。结果表明,在磁场的作用下,反应室上部的ECR等离子体的径向和轴向均匀性较差。但是,反应室的下游区域中的等离子体具有良好的径向均匀性。这种出色的下游均匀等离子体在等离子体工艺中具有广泛的应用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号