首页> 外国专利> PROCESS LIQUID SUPPLY UNIT, LIQUID TREATMENT DEVICE, PROCESS LIQUID SUPPLY METHOD AND STORAGE MEDIUM

PROCESS LIQUID SUPPLY UNIT, LIQUID TREATMENT DEVICE, PROCESS LIQUID SUPPLY METHOD AND STORAGE MEDIUM

机译:过程液体供应单元,液体处理装置,过程液体供应方法和存储介质

摘要

A process liquid supply unit, a liquid treating device, a process liquid supply method, and a storage medium are provided to successively treat an object to be treated without a standby time by preventing generation of a pulsation in a process liquid supplied to the object to be treated. A first supply part(10) circulates a process liquid, and supplies the process liquid to a process part(60). A second supply part(20) supplies a process liquid to the process part. A control part(50) controls a flow of the process liquid inside the first supply part and the second supply part. The first supply part includes a first sending unit(13) which sends a driving force to the process liquid. The second supply part includes a second sending unit(23) which sends a driving force to the process liquid. The control part stops a supply of the process liquid from the first supply part to the process part by controlling the second sending unit.
机译:提供一种处理液供应单元,液体处理装置,处理液供应方法和存储介质,以通过防止在供应到被处理物的处理液中产生脉动来连续地处理被处理物,而无需等待时间。被视为。第一供应部(10)使处理液循环,并将处理液供应至处理部(60)。第二供应部(20)将处理液供应至处理部。控制部(50)控制第一供给部和第二供给部内的处理液的流动。第一供给部包括将驱动力发送至处理液的第一发送单元(13)。第二供应部分包括第二发送单元(23),其将驱动力发送到处理液。控制部通过控制第二发送单元,停止从第一供给部向处理部的处理液的供给。

著录项

  • 公开/公告号KR20090038817A

    专利类型

  • 公开/公告日2009-04-21

    原文格式PDF

  • 申请/专利权人 TOKYO ELECTRON LIMITED;

    申请/专利号KR20080100593

  • 发明设计人 YAMAMOTO SHU;

    申请日2008-10-14

  • 分类号H01L21/302;H01L21/304;

  • 国家 KR

  • 入库时间 2022-08-21 19:13:36

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号