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PROCESS LIQUID SUPPLY UNIT, LIQUID TREATMENT DEVICE, PROCESS LIQUID SUPPLY METHOD AND STORAGE MEDIUM
PROCESS LIQUID SUPPLY UNIT, LIQUID TREATMENT DEVICE, PROCESS LIQUID SUPPLY METHOD AND STORAGE MEDIUM
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机译:过程液体供应单元,液体处理装置,过程液体供应方法和存储介质
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摘要
A process liquid supply unit, a liquid treating device, a process liquid supply method, and a storage medium are provided to successively treat an object to be treated without a standby time by preventing generation of a pulsation in a process liquid supplied to the object to be treated. A first supply part(10) circulates a process liquid, and supplies the process liquid to a process part(60). A second supply part(20) supplies a process liquid to the process part. A control part(50) controls a flow of the process liquid inside the first supply part and the second supply part. The first supply part includes a first sending unit(13) which sends a driving force to the process liquid. The second supply part includes a second sending unit(23) which sends a driving force to the process liquid. The control part stops a supply of the process liquid from the first supply part to the process part by controlling the second sending unit.
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