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P-TYPE ZNO SEMICONDUCTOR BY LI AND COLUMN VII IMPURITY CODOPING

机译:Li和VII杂质掺杂的P型ZNO半导体

摘要

A p type ZnO semiconductor doping Li and 7 group impurity is provided to facilitate formation of compound by increasing the bonding energy for forming Li-7 group-Li impurity compound with the coulomb interaction between two impurities. The Li and VII group doped with the impurity of Li and VII group is implanted into a ZnO which is II-IV group semiconductor. The density of the impurity of Li is higher than the density of the 7 group impurity. A ratio of the impurity of Li and 7 group is 2:1. The 7 group impurity has the element of F.
机译:提供p型ZnO半导体掺杂Li和7族杂质,以通过增加用于形成具有两个杂质之间的库仑相互作用的Li-7族-Li杂质化合物的结合能来促进化合物的形成。将掺杂有Li和VII基团的杂质的Li和VII基团注入到作为II-IV族半导体的ZnO中。 Li的杂质的密度高于7族杂质的密度。 Li与7族的杂质之比为2∶1。 7族杂质具有F元素。

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