EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD TO PREVENT CONTAMINATION OF OPTICAL ELEMENT

摘要

PURPOSE: An exposure apparatus is provided to maintain the transmittance ratio of the exposure light and prevent the contamination of the optical element.;CONSTITUTION: The exposure apparatus(700) exposes the circuit pattern formed in the vacuum on the top of the substrate. The exposure apparatus includes the vacuum chamber(1~5), and wire electrode array(30). The vacuum chamber has a plurality of the regions. The wire electrode array has parallel wire electrodes. The wire electrode array has the first wire electrode group, and the second wire electrode group. The first wire electrode group is arranged to the opening(25~28) of the exposure light at a boundary between adjacent vacuum chambers. In the first wire electrode group, the AC voltage of the first phase is applied. In the second wire electrode group, the different from the first phase AC voltage of the second phases is applied.;COPYRIGHT KIPO 2010