EXPOSURE APPARATUS CAPABLE OF PERFORMING AN ACCURATE EXPOSURE CONTROL IN ALL SURFACES, AND A MANUFACTURING METHOD OF A DEVICE

摘要

PURPOSE: An exposure apparatus and a manufacturing method of a device are provided to perform an accurate exposure control in all surfaces by separately controlling semiconductor light sources according to an exposure pattern.;CONSTITUTION: An exposure apparatus(100) exposes a substrate through a mask(400) with a light having a set light source(200) shape, and includes a plurality of light sources and a light source control part(700). A plurality of light sources is arranged into two-dimension. The light source control part controls the light sources through data of lighting modes according to a light source shape.;COPYRIGHT KIPO 2010