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Exposure apparatus, surface position control method, exposure method, and semiconductor device manufacturing method
Exposure apparatus, surface position control method, exposure method, and semiconductor device manufacturing method
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机译:曝光装置,表面位置控制方法,曝光方法以及半导体装置的制造方法
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摘要
According to one embodiment, there is provided an exposure apparatus, including a focus detecting system, a stage, and a controller. On the stage, a substrate is to be mounted. The controller performs focus measurement on an incomplete shot area, part of which is outside a pattern forming area of the substrate, by the focus detecting system. The controller obtains amounts of defocus of a plurality of planes that are candidates for approximating the incomplete shot area according to the result of measuring the incomplete shot area. The controller decides on a plane to approximate the incomplete shot area from among the plurality of planes according to the amounts of defocus of the plurality of planes. The controller drives the stage using a focus-leveling value according to the decided-on plane so as to control a surface position of the incomplete shot area.
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