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THIN FILM TYPE ELECTRON SOURCE AND METHOD FOR MANUFACTURING THE SAME AND THIN FILM TYPE ELECTRON SOURCE APPLICATION DEVICE
THIN FILM TYPE ELECTRON SOURCE AND METHOD FOR MANUFACTURING THE SAME AND THIN FILM TYPE ELECTRON SOURCE APPLICATION DEVICE
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机译:薄膜型电子源及其制造方法和相同的薄膜型电子源应用装置
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摘要
The present invention is to provide a thin-film electron source with the high heat resistance . ; The present invention is therefor provided with the upper electrode formed in contact with the substrate, and a lower electrode formed on one main surface side of the substrate , and the insulating layer formed in contact with the lower electrode , the insulating layer in the thin-film electron source , and the upper electrode of the first underlayer , a second underlayer , an intermediate layer , a laminated structure of the surface layer , wherein the first underlayer is IrO 2 or RuO 2 a as the main constituent material and the second layer and the underlying Ir or Ru as the main constituent material , the intermediate layer is PtIr, PtRu, the type being selected from the group of the main constituent material and PtRh , the the surface layer is Au, and the type being selected from the group of Ag as the main constituent material .
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