Thin film type electron source and manufacturing method of thin film type electron source and display device

摘要

A method of manufacturing a thin film type electron source having a lower electrode (11), an upper electrode, and an insulating layer provided between the lower electrode (11) and the upper electrode, and a first step of forming an anodic oxide film on the surface of the lower electrode (11) by an anodic oxidation method and said first A second step of removing the surface of the anodic oxide film formed in the step by etching is performed, and after the second step, an anodic oxide film is formed on the surface of the lower electrode (11) by an anodic oxidation method to form an insulating layer. Thus, the thickness of the insulating layer outer layer (26) having a large amount of impurities is reduced in the insulating layer formed of the anodic oxide film in the thin film type electron source, and the electron trap amount can be reduced.