首页> 外国专利> METHOD FOR CONTACTING ELECTRICAL CONTACT SURFACES OF A SUBSTRATE AND DEVICE CONSISTING OF A SUBSTRATE HAVING ELECTRICAL CONTACT SURFACES

METHOD FOR CONTACTING ELECTRICAL CONTACT SURFACES OF A SUBSTRATE AND DEVICE CONSISTING OF A SUBSTRATE HAVING ELECTRICAL CONTACT SURFACES

机译:接触基材的电接触表面的方法和具有接触表面的基材的设备

摘要

The present invention relates to a method for connecting an electrical contact surface (21, 112) on the surface 20 of the substrate 1. According to this method, the film (3) based on polyimide or epoxy is completely covering the surface including the contact surface in the vacuum is deposited onto the surface in a way that is adhered to the surface. Due to the individual film opening window 31 do not contact each side is overwritten to be connected on the surface, a contact is formed in a plane that is not between each cover contact surface and the metal layer (4). The process according to the invention is used to form a large area of ​​contact for the power semiconductor chip, enabling the high current density.
机译:本发明涉及一种在基板1的表面20上连接电接触表面(21、112)的方法。根据该方法,基于聚酰亚胺或环氧树脂的膜(3)完全覆盖包括接触的表面。真空中的表面以粘附到表面的方式沉积在表面上。由于各个膜开口窗31的不接触面的两面被覆盖而被覆盖在表面上,因此在各盖接触面与金属层(4)之间不存在的面上形成接触。根据本发明的方法用于为功率半导体芯片形成大面积的接触,从而实现高电流密度。

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