Method of preventing wafer edge defocus of a exposure tool

摘要

A method for preventing a wafer edge defocus of an exposure apparatus is provided to perform focusing and exposure suitable for a process condition and a wafer state by setting an automatic focus formation by user according to the process condition and the wafer state. A jop file of an exposure apparatus is set(S100). A jop file of a device and a layer is set(S200). Wafer map information is set by receiving the jop file of the exposure apparatus, the device, and the layer(S300). A user directly sets an automatic focus sensor formation in the wafer map information(S400). The user directly sets automatic focus formation information about a shot to be exposed through the exposure apparatus. The user forms the automatic focus sensor formation to a wafer map in a process program of the exposure apparatus.