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METHOD AND SYSTEM FOR DESIGN RULE CHECKING ENHANCED WITH PATTERN MATCHING

机译:通过图案匹配增强设计规则检查的方法和系统

摘要

PPROBLEM TO BE SOLVED: To enable circuit designers to waive certain design rules for their circuit designs. PSOLUTION: One embodiment of the invention includes receiving a first layout pattern containing a new layout of an integrated circuit pattern, a pattern matcher 110 processes the layout pattern and designates certain patterns of the integrated circuit pattern that meet design waiver information. The pattern matcher 110 generates a second layout pattern with the waived patterns marked. A design rule checker 115 subsequently processes the marked layout pattern and validates all but the marked patterns of the second layout pattern against a set of specified design rules. The design rule checker 115 generates a third layout pattern with only the unmarked patterns of the layout being validated against the set of specified design rules. PCOPYRIGHT: (C)2010,JPO&INPIT
机译:

要解决的问题:使电路设计师可以放弃某些电路设计规则。解决方案:本发明的一个实施例包括接收包含集成电路图案的新布局的第一布局图案,图案匹配器110处理该布局图案并指定满足设计豁免信息的集成电路图案的某些图案。模式匹配器110生成带有被标记的豁免模式的第二布局模式。设计规则检查器115随后处理标记的布局图案,并对照一组指定的设计规则来验证第二布局图案的除了标记的图案之外的所有图案。设计规则检查器115生成第三布局图案,其中仅针对指定的设计规则的集合验证布局的未标记图案。

版权:(C)2010,日本特许厅&INPIT

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