METHOD AND SYSTEM FOR DESIGN RULE CHECKING ENHANCED WITH PATTERN MATCHING

摘要

According to various embodiments of the invention, systems and methods for design rule checking enhanced with pattern matching is provided, wherein the design rule checker ignores certain patterns of the layout that violate design rules during validation. One embodiment of the invention includes receiving a first layout pattern that containing the original layout of an integrated circuit pattern. The pattern matcher processes the layout pattern and designates certain patterns of the integrated circuit pattern that meet a design waiver. The pattern matcher generates a second layout pattern with the waived patterns marked. The design rule checker subsequently processes the marked layout pattern and validates all but the marked patterns of the second layout pattern against a set of specified design rules. The design rule checker generates a third layout pattern with only the unmarked patterns of the layout being validated against the set of specified design rules.