MICRO ELECTRIC MECHANICAL SYSTEM DEVICE AND MANUFACTURING METHOD FOR THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a MEMS device which has a small parasitic capacitance applied to a MEMS element through a semiconductor substrate and is superior in reliability.;SOLUTION: The MEMS device comprises a semiconductor substrate 1 such as a silicon substrate, an insulation coating layer 2 formed in the shape of an island on the semiconductor substrate 1, an inorganic insulating film 3 formed on an entire surface of the semiconductor substrate 1 to cover the island-shaped insulation coating layer 2, a pattern of a wiring layer 4 formed on the inorganic insulating film 3 in an island-shaped region where the insulation coating layer 2 is formed, and the MEMS element 5 formed on the pattern of the wiring layer 4.;COPYRIGHT: (C)2010,JPO&INPIT