PATTERN VERIFICATION METHOD, PATTERN VERIFICATION SYSTEM, PATTERN VERIFICATION PROGRAM, METHOD FOR MANUFACTURING MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a pattern verification method by which a fine pattern can be efficiently formed with high accuracy.;SOLUTION: The method includes steps of: acquiring information relating to a transfer pattern onto a substrate from a design pattern of the pattern to be formed on a substrate, as pattern transfer information (step 1); comparing the design pattern with the transfer pattern and classifying the pattern transfer information and the design pattern, based on the characteristic amount obtained by the comparison (step 2); setting a threshold with respect to the characteristic amount and further, classifying the pattern transfer information and the design pattern already classified based on the characteristic amount, based on the threshold (step 3); and verifying whether the transfer pattern satisfies the threshold (step 5).;COPYRIGHT: (C)2010,JPO&INPIT