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How to do the transmittance adjustment of the mask pattern in order to improve the process latitude
How to do the transmittance adjustment of the mask pattern in order to improve the process latitude
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机译:如何进行掩模图案的透射率调整以提高工艺宽容度
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摘要
A method of generating a mask for use in a photolithography process. The method includes the steps of determining a target mask pattern having a plurality of features to be imaged and an illumination system to be utilized to image the mask; identifying a critical pitch within the target pattern and optimizing illumination settings of the illumination system for imaging the critical pitch; identifying a forbidden pitch within the target pattern; and modifying the transmittance of the features having a pitch equal to or substantially equal to the forbidden pitch such that the exposure latitude of the features equal to or substantially equal to the forbidden pitch is increased. IMAGE
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