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A method for performing transmission tuning of a mask pattern to improve process latitude
A method for performing transmission tuning of a mask pattern to improve process latitude
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机译:一种用于执行掩模图案的传输调谐以提高处理范围的方法
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摘要
A method of generating a mask for use in a photolithography process. The method includes the steps of determining a target mask pattern having a plurality of features to be imaged and an illumination system to be utilized to image the mask; identifying a critical pitch within the target pattern and optimizing illumination settings of the illumination system for imaging the critical pitch; identifying a forbidden pitch within the target pattern; and modifying the transmittance of the features having a pitch equal to or substantially equal to the forbidden pitch such that the exposure latitude of the features equal to or substantially equal to the forbidden pitch is increased.
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