Manufacturing method of the platinum content thin film due to the chemical vapor phase vapor deposition method which uses the organic platinum complex and the particular platinum complex

摘要

As the organic platinum complex of this invention is shown with general system (1) is the new platinum complex which, it possesses fusion point low, it is superior in stability at the same time vis-a-vis the moisture, the air and heat, it is suitable for the production of the platinum content thin film with CVD method. Conversion 1 (In formula, X and Y the carbon count 1 which is good being substituted by the respective independence, with alkoxy group - 8 direct or shows the alkyl group of ramification condition, Z, the hydrogen atom, or carbon count 1 - 4 direct or shows the alkyl group of ramification condition, as for L, the arukokishiarukeniru basis (was substituted direct or the arukeniru basis of ramification condition) shows with alkoxy group.)