首页> 中文期刊> 《材料科学技术:英文版 》 >AFM Studies of Platinum Silicide Thin Films on Silicon Grown by Pulsed Laser Deposition

AFM Studies of Platinum Silicide Thin Films on Silicon Grown by Pulsed Laser Deposition

             

摘要

PtSi ultra-thin films were grown on Si-wafer using pulsed laser deposition (PLD). The surface structure of these films was studied by atomic force microscopy (AFM). In addition, the compositional structure of the PtSi as determined from X-ray photoelectron spectroscopy (XPS) is discussed. First report of a possible growth mechanism is presented, on studying the variation of morphological features (i.e., roughness and size of crystallites) with annealing temperatures and the film thicknesses.

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