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Rocking Y-shaped probe for critical dimension atomic force microscopy

机译:临界尺寸原子力显微镜的摇摆Y型探头

摘要

Measuring surface profiles of structures on integrated circuits is difficult when feature sizes are less than 100 nanometers. Atomic force microscopy provides surface profile measurement capability on flat horizontal surfaces, but has difficulty with three-dimensional structures such as MOS transistor gates, contact and via holes, interconnect trenches and photoresist patterns. An atomic force microscopy probe with two atomically sharp tips configured to facilitate measurements of three-dimensional structures is disclosed. A method of making such measurements using the disclosed probe and a method of fabricating an IC encompassing the method are also claimed.
机译:当特征尺寸小于100纳米时,很难在集成电路上测量结构的表面轮廓。原子力显微镜可在平坦的水平表面上提供表面轮廓测量功能,但在三维结构(例如MOS晶体管栅极,接触孔和过孔,互连沟槽和光刻胶图案)方面存在困难。公开了一种具有两个原子锐利的尖端的原子力显微镜探针,所述原子锐利的尖端被配置为促进三维结构的测量。还要求保护一种使用所公开的探针进行这种测量的方法以及一种包括该方法的IC的制造方法。

著录项

  • 公开/公告号US7797991B2

    专利类型

  • 公开/公告日2010-09-21

    原文格式PDF

  • 申请/专利权人 VLADIMIR ALEXEEVICH UKRAINTSEV;

    申请/专利号US20070874613

  • 发明设计人 VLADIMIR ALEXEEVICH UKRAINTSEV;

    申请日2007-10-18

  • 分类号G01B5/28;

  • 国家 US

  • 入库时间 2022-08-21 18:51:12

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