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Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret
Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret
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机译:使用电子或光束模糊技术进行单相移掩模ret的连续倾斜相边缘架构制造技术
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摘要
A phase shift mask may include boundaries between phase shift regions with continuous sloped phase edges. The continuous sloped phase edges may be produced by introducing a predetermined degree of defocus into a beam used during production of the mask to image the pattern on the mask. Such a phase shift mask may be “trimless”, i.e., not require a corresponding binary “trim” mask for a second exposure to remove phase conflicts after exposure with the phase shift mask.
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