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Non-volatile memory devices and programming methods thereof including moving electrons through pad oxide layers between charge trap layers

机译:非易失性存储器件及其编程方法,包括使电子移动通过电荷陷阱层之间的焊盘氧化层

摘要

Non-volatile memory devices and methods of programming a non-volatile memory device in which electrons are moved between charge trap layers through a pad oxide layer are provided. The non-volatile memory devices include a charge trap layer on a semiconductor substrate and storing electrons, a pad oxide layer on the first charge trap layer, and a second trap layer on the pad oxide layer and storing electrons. In a programming mode in which data is written, the stored electrons are moved between a first position of the first charge trap layer and a first position of the second charge trap layer through the pad oxide layer or between a second position of the first charge trap layer and a second position of the second charge trap layer through the pad oxide layer.
机译:提供了非易失性存储器件和对非易失性存储器件进行编程的方法,其中,电子通过焊盘氧化物层在电荷陷阱层之间移动。非易失性存储器件包括在半导体基板上并存储电子的电荷陷阱层,在第一电荷陷阱层上的焊盘氧化物层以及在焊盘氧化物层上并存储电子的第二陷阱层。在其中写入数据的编程模式中,所存储的电子通过焊盘氧化物层在第一电荷陷阱层的第一位置与第二电荷陷阱层的第一位置之间或在第一电荷陷阱的第二位置之间移动。通过垫氧化物层的第二层和第二电荷陷阱层的第二位置。

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