Electron beam drawing mask blank, electron beam drawing mask, and method of manufacturing the same

摘要

An electron beam drawing mask includes a pattern supporting film for transmitting an electron beam therethrough; an electron beam scattering body pattern formed over the pattern supporting film; and a support member for supporting the pattern supporting film and the electron beam scattering body pattern. The pattern supporting film has a film thickness of 0.005 to 0.2 micron, a film material density of 1.0 to 5.0 g/cm3 and an elastic modulus of 0.8 x 1011 Pa or higher. The electron beam scattering body pattern has a film thickness of 0.2 to 2 micron, a film material density of 1.0 to 5.0 g/cm3, and an elastic modulus of 0.8 x 1011 Pa or higher.