首页> 外国专利> MULTI-LAYER FILM SPECTROSCOPIC ELEMENT FOR BORON FLUORESCENCE X-RAY ANALYSIS

MULTI-LAYER FILM SPECTROSCOPIC ELEMENT FOR BORON FLUORESCENCE X-RAY ANALYSIS

机译:多层膜光谱元素用于硼荧光X射线分析

摘要

There is provided a multilayered spectroscopic device effective to achieve in a short length of time the highly accurate fluorescent X-ray analysis of boron wherein the influence that may be brought about by the interfering X-rays and the background is sufficiently reduced and the strength of reflection of B-Kα line is sufficient. In this multilayered spectroscopic device 3, lanthanum (La), an alloy containing lanthanum as a principal component or lanthanum oxide (La2O3) is used for the reflecting layers 31 and boron is used for the spacer layers 32 and the periodic length d is chosen to be within the range of 7 to 14 nm and the film thickness ratio of the reflecting layers 31 to the spacer layers 32 is chosen to be within the range of 2/3 to 3/2. It has a total laminated film thickness t of a value sufficient to allow the strength of reflection of B-Kα line to be equal to or higher than 98% of a saturation value.
机译:提供了一种多层光谱装置,其有效地在短时间内实现了硼的高精度荧光X射线分析,其中干扰X射线和背景可能引起的影响被充分降低,并且强度得到了提高。 B-Kα线的反射就足够了。在该多层光谱装置3中,镧(La),包含镧作为主要成分的合金或氧化镧(La2O3)被用作反射层31,并且硼被用作间隔层32,并且周期长度d被选择为反射层31与间隔层32的膜厚比在7nm至14nm的范围内,并且反射层31与间隔层32的膜厚比被选择在2/3至3/2的范围内。其层压膜总厚度t的值足以使B-Kα线的反射强度等于或高于饱和值的98%。

著录项

  • 公开/公告号EP1318393B1

    专利类型

  • 公开/公告日2010-10-20

    原文格式PDF

  • 申请/专利权人 RIGAKU DENKI CO LTD;

    申请/专利号EP20020730818

  • 发明设计人 SHIMIZU KAZUAKIC/O RIGAKU CORPORATION;

    申请日2002-05-30

  • 分类号G01N23/223;G21K1/06;

  • 国家 EP

  • 入库时间 2022-08-21 18:40:09

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