首页> 外国专利> METHOD FOR APPLYING A THIN-FILM ENCAPSULATION LAYER ASSEMBLY TO AN ORGANIC DEVICE, AND AN ORGANIC DEVICE PROVIDED WITH A THIN-FILM ENCAPSULATION LAYER ASSEMBLY PREFERABLY APPLIED WITH SUCH A METHOD

METHOD FOR APPLYING A THIN-FILM ENCAPSULATION LAYER ASSEMBLY TO AN ORGANIC DEVICE, AND AN ORGANIC DEVICE PROVIDED WITH A THIN-FILM ENCAPSULATION LAYER ASSEMBLY PREFERABLY APPLIED WITH SUCH A METHOD

机译:将薄膜封装层组装到有机设备上的方法,以及组装有薄膜封装层的有机设备,通常采用这种方法

摘要

A method for applying a thin-film encapsulation layer assembly to an organic device, which comprises a substrate which is provided with an active stack and is then provided with the thin-film encapsulation layer assembly for screening the active stack substantially from oxygen and moisture, wherein the thin-film encapsulation layer assembly is formed by applying at least one organic and at least one inorganic layer applied with PECVD or reactive sputtering, onto the active stack, wherein after application of a first organic layer a metal layer is applied to the first organic layer before an inorganic layer is applied thereto utilizing PECVD or reactive sputtering, wherein the metal layer is applied utilizing a deposition technique that causes relatively little radiation, wherein the metal layer protects the organic layer against radiation upon a subsequent PECVD or reactive sputtering process step for applying an inorganic layer. The invention also relates to an organic device manufactured with such a method.
机译:一种将薄膜封装层组件施加到有机器件的方法,该方法包括:衬底,该衬底设置有有源叠层,然后设置有薄膜封装层组件,用于从氧气和水分中基本上屏蔽掉有源叠层,其中所述薄膜封装层组件是通过将至少一个有机层和至少一个通过PECVD或反应溅射法涂覆的无机层涂覆到有源堆叠上而形成的,其中在涂覆第一有机层之后,将金属层涂覆到第一在通过PECVD或反应溅射将无机层施加到有机层之前,其中通过使用产生相对较少辐射的沉积技术施加金属层,其中在随后的PECVD或反应溅射工艺步骤中,金属层保护有机层免受辐射用于施加无机层。本发明还涉及用这种方法制造的有机器件。

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