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METHOD AND DEVICE FOR THE INFILTRATION OF A STRUCTURE OF A POROUS MATERIAL BY CHEMICAL VAPOUR DEPOSITION
METHOD AND DEVICE FOR THE INFILTRATION OF A STRUCTURE OF A POROUS MATERIAL BY CHEMICAL VAPOUR DEPOSITION
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机译:化学气相沉积渗透多孔结构的方法和装置
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摘要
The invention relates to a method and a device for the infiltration of a structure made of a porous material by chemical vapour deposition. According to the method, a first face of the porous material structure is exposed to a gaseous flow, and the second face is maintained at least partially free from any contact.
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