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method and device for infiltration of a structure of a porous material by chemical vapour deposition
method and device for infiltration of a structure of a porous material by chemical vapour deposition
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机译:化学气相沉积渗透多孔材料结构的方法和装置
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摘要
The present invention relates to a method and device for the infiltration of a structure in the porous material by chemical vapor deposition. In the process, a first face of the structure of a porous material being exposed to a gas flow, it maintains the second face, at least in part, free from any contact.
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