METHOD FOR MEASURING A PHASE OF A PHASE SHIFT MASK AND A DEVICE FOR PERFORMING THE SAME, DIVIDING AN EXTREME ULTRAVIOLET RAY USING PIN HOLES OF A DIVISION UNIT

摘要

PURPOSE: A method for measuring a phase of a phase shift mask and a device for performing the same are provided to form a wanted pattern on a semiconductor substrate using the divided extreme ultraviolet rays.;CONSTITUTION: An initial extreme ultraviolet ray is divided into two extreme ultraviolet rays(S201). The extreme ultraviolet rays are irradiated on a phase shift mask(S205). The extreme ultraviolet rays reflected from the phase shift mask is detected(S207). An interference pattern is obtained from the detected ultraviolet rays(S209). The shift level of the obtained interference pattern is measured from the reference interference pattern(S211).;COPYRIGHT KIPO 2010