PHOTO KEY AND A METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME, CAPABLE OF IMPROVING THE RELIABILITY OF AN EXPOSURE PROCESS

摘要

PURPOSE: A photo key and a method for manufacturing a semiconductor device using the same are provided to prevent the height of photo key regions from reducing while the photo key regions are chemically and mechanically grinded by inserting conductive patterns in the photo key regions.;CONSTITUTION: Photo key regions(12), first conductive patterns(18) and a second conductive pattern(20) are prepared. The photo key regions are formed to be spaced apart on a semiconductor substrate(10). The first conductive pattern is formed to be spaced apart in one photo key region. The second conductive pattern is formed between and around the first conductive patterns.;COPYRIGHT KIPO 2010