首页> 外国专利> NONVOLATILE MEMORY DEVICE INCLUDING A CHARGE TRAPPING LAYER WITH THE ALTERNATIVELY STACKED FIRST AND SECOND CHARGE TRAPPING LAYER

NONVOLATILE MEMORY DEVICE INCLUDING A CHARGE TRAPPING LAYER WITH THE ALTERNATIVELY STACKED FIRST AND SECOND CHARGE TRAPPING LAYER

机译:非易失性存储器,包括带有交替堆叠的第一和第二电荷捕获层的电荷捕获层

摘要

PURPOSE: A nonvolatile memory device is provided to improve a charge retention property of the nonvolatile memory device by suppressing the horizontal and vertical movement of the charges.;CONSTITUTION: A charge trapping layer(120) is formed between a semiconductor substrate and a gate electrode. A charge tunneling layer is formed between the charge trapping layer and the semiconductor substrate. A charge blocking layer is formed between the gate electrode and the charge trapping layer. A first charge trapping layer(122) and a second charge trapping layer(124) are repeatedly stacked on the charge trapping layer. The first charge trapping layer has a first energy band gap. The second charge trapping layer has a larger energy band gap than a first energy band gap.;COPYRIGHT KIPO 2010
机译:目的:提供一种非易失性存储器件,以通过抑制电荷的水平和垂直移动来改善非易失性存储器件的电荷保持性能。;构成:在半导体衬底和栅电极之间形成电荷捕获层(120) 。在电荷俘获层与半导体衬底之间形成电荷隧穿层。在栅电极和电荷俘获层之间形成电荷阻挡层。第一电荷捕获层(122)和第二电荷捕获层(124)重复地堆叠在电荷捕获层上。第一电荷俘获层具有第一能带隙。第二电荷捕获层的能带隙比第一能带隙大。; COPYRIGHT KIPO 2010

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号