(METH)ACRYLATE COMPOUND, PHOTOSENSITIVE POLYMER HAVING EXCELLENT EDGE ROUGHNESS, AND A RESIST COMPOSITION WHICH PROVIDES EXCELLENT LITHOGRAPHY PERFORMANCE

摘要

PURPOSE: A (meth)acrylate compound, photosensitive polymer, and resist composition are provided to ensure excellent adhesion property and width edge roughness.;CONSTITUTION: A (meth)acrylate compound contains dioxolane group of chemical formula 1. A photosensitive polymer contains a repeat unit which is induced from a compound of chemical formula 1, 2, or 3. The photosensitive polymer has 3,000-20,000 of weight average molecular weight. A resist composition comprises the photosensitive polymer, photoacid generator, and solvent. The photoacid generator is triarylsulfonium salts, diaryliodonium salts, sulfonates, or mixture thereof. The resist composition further contains 0.1-1.0 weight parts of organic base based on 100 weight parts of photosensitive polymer.;COPYRIGHT KIPO 2010