Organic ruthenium compound for chemical vapor deposition, and chemical vapor deposition method using the organic ruthenium compound

摘要

The present invention provides an organic ruthenium compound for the preparation of a ruthenium thin film or a ruthenium compound thin film by chemical vapor deposition , represented by the following formula , the present invention relates to a group, and norbornyl or arene diene coordination ( ) organic ruthenium compounds of ruthenium . The present invention also riaek Assistant gas without requiring the co-existence of oxygen is , also relates to a handling property , the recycling of organic ruthenium compound having excellent chemical vapor deposition of a liquid at room temperature . ; ( formula one , the substituents of the arene group R ₁ ~ R ₆ is hydrogen or an alkyl group . Further , R ₁ ~ R ₆ of the total number of carbon atoms (R ₁ + R ₂ + R ₃ + R ₄ + R ₅ + R ₆ ) is 6 or less .)