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SOURCE extreme ultra-violet radiation with a laser plasma at a wavelength of 13.4 NM

机译:源具有13.4 NM波长的激光等离子体的极紫外辐射

摘要

The utility model is intended for use in nanolithography and devices for microscopy or tomography of working in the extreme ultraviolet region with a wavelength of about 13.5 nm. The object of the utility model is to increase the conversion efficiency of the laser radiation in the extreme ultraviolet protection used in Bragg mirrors source of contamination caused by charged particles of the target, as well as saving the power source current solenoids, the magnetic field generating system and protect parts from the magnetic field of mechanical displacements. EUV radiation source with a laser plasma at a wavelength of 13.4 nm, consisting of a target, the collector of the Bragg mirror and the primary laser pulse (sources) with their optical systems focus on the target, characterized in that used as a target rewound, passed through the capillary , thin wire, tin-plated tin-plated or tin alloy (composition) and as a primary laser source using two lasers: a first - relatively short wavelength, Focus vanny on the wire surface, which serves to tin sublimation, generating a plasma cloud and preheating, and the second - the long wavelength, CO 2 laser for optimal plasma temperature focused over the target directly on the plasma cloud and emitting a light pulse with a predetermined time delay relative to the first laser . In addition, the source along the axis of the wire creates a pulse magnetic field synchronized with the laser pulses and directed therealong, wherein the field is produced within the closed bochenkoobraznogo yoke having holes for the passage of the radiation beams as the primary lasers and extreme ultraviolet radiation that is closed at magnetic field with missing capillary wire therethrough, which are made of magneto-concentrating alloys. In addition, source generated pulsed jet of inert gas directed along the thin wire through the capillary, which is passed through the wire, moreover, the capillary wall is provided with a one-way (non-through) hole for passage to the surface of the first wire (with respect to short-wave) laser pulse.
机译:本实用新型打算用于在波长约为13.5nm的极紫外区域中工作的纳米平版印刷术和显微镜或层析成像设备。本实用新型的目的是提高布拉格反射镜所用的极紫外防护中激光辐射的转换效率,该靶源由目标的带电粒子引起的污染源,以及节省电源电流的螺线管,产生磁场系统并保护零件免受机械位移的磁场的影响。具有波长为13.4 nm的激光等离子体的EUV辐射源,由目标,布拉格镜的收集器和主激光脉冲(源)及其光学系统聚焦在目标上,其特征在于用作目标回旋穿过毛细管,细线,镀锡的镀锡或锡合金(成分),并作为主要的激光源,使用两种激光:第一种-相对较短的波长,将范尼聚焦在金属丝表面,用于锡的升华,产生等离子云并进行预热,第二种-长波长CO 2 激光器用于最佳等离子温度,直接聚焦在等离子云上的目标上,并以相对于预定时间的延迟发射光脉冲到第一个激光。另外,沿着导线轴线的源产生与激光脉冲同步并沿其定向的脉冲磁场,其中该磁场在封闭的bochenkoobraznogo轭内产生,该轭具有用于使辐射束作为主要激光通过的孔,并且在在磁场中关闭的紫外线辐射,其中缺少由磁性浓缩合金制成的毛细管,该毛细管没有通过。另外,惰性气体源产生的惰性气体的脉冲射流沿着细线穿过毛细管,并穿过细线,此外,毛细管壁上还设有一个单向(非直通)孔,该通孔可通向毛细管的表面。第一线(相对于短波)激光脉冲。

著录项

  • 公开/公告号RU94003U1

    专利类型

  • 公开/公告日2010-05-10

    原文格式PDF

  • 申请/专利权人

    申请/专利号RU20090102710U

  • 申请日2009-01-27

  • 分类号G03F7/20;

  • 国家 RU

  • 入库时间 2022-08-21 18:29:22

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