Arrangement for illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structural patterns

摘要

The invention relates to an arrangement for the illumination of a substrate with a plurality of individually shaped controllable particle beams, in particular for the electron beam lithography in the semiconductor industry.The object, a new possibility for the illumination of a substrate (91) having a plurality of individually shaped controllable particles part rays (118) the invention to find a high-resolution structuring of substrates with a high substrate flow rate without the flexibility of the structural pattern which can be used to restrict or as a result of the required flexibility of the invention is not restricted to the high substrate flow rate, is solved according to the invention, by a first and a second aperture diaphragms array as multi format diaphragms arrays (41, 42) for the generation of particles part rays (118) with different jet cross-sections are developed and the first and the second multi format diaphragms array (41, 42) at least three multi beam deflector arrays (51, 52, 53) for the individual deflection of the particles part rays (118) are assigned, wherein at least a multi beam deflector array (51) between the first and second multi format diaphragms array (41, 42) is arranged to different cross sections of the particles part rays (118) to be produced, at least one second multi beam deflector array (52) in the vicinity of the second multi format diaphragms arrays (42) is arranged to individual particles part rays (118) into individual crossover, deflecting or scanning, and at least one ..