Arrangement for illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structural patterns

摘要

Arrangement for illumination of a substrate with a plurality of individually shaped controllable particle beams (118) having a particle beam source (1) for the transmission of a particle beam (11), an illumination system (2) for forming and deflection of the particle beam (11) for the illumination of a first aperture diaphragms arrays, wherein the aperture diaphragms array a multi diaphragms array for the production of separate particles part rays (118), a second multi diaphragms array, to which the first multi diaphragms array by means of a condenser lenses system (31, 32) is imaged and which, under consideration of the imaging scale to the first multi diaphragms array is adapted to that of the diaphragm openings (44), one of multi beam deflector arrays existing multi beam deflector system (5) for the individual beam deflection of the separate particle beams (118) as well as an at least one-stage reducing optical system (6) to the reduced image of the from the second aperture diaphragms array transmitted particles part rays (118) on a substrate (91),characterized in that– the first and the second multi diaphragms array as multi format diaphragms arrays (41, 42) for the generation of particles part rays (118) with different jet cross-sections are provided, and– the first multi format diaphragms array (41) and the second multi format diaphragms array (42) at least three multi beam deflector arrays..