首页> 外国专利> Vacuum-deposition plant producing e.g. organic light-emitting diodes or organic solar cells, first deposits materials onto belt then re-vaporizes for deposition onto substrate

Vacuum-deposition plant producing e.g. organic light-emitting diodes or organic solar cells, first deposits materials onto belt then re-vaporizes for deposition onto substrate

机译:真空沉积设备生产例如有机发光二极管或有机太阳能电池,首先将材料沉积到皮带上,然后重新蒸发以沉积到基材上

摘要

The material to be deposited (4) is vaporized twice. A first unit (2) vaporizes the material at a first location (3) close to a moveable intermediate carrier (5). The material is deposited onto the carrier, coating it. The coated carrier is moved to a second location (6) close to the substrate to be coated (8). Here the material on the carrier is vaporized a second time and deposited onto the substrate. The intermediate carrier is a continuous belt or rotary disc. It is cooled (9) near the first vaporization unit. A heater (7) on the opposite side of the carrier performs the second vaporization, over an interval of 0.001 - 10 seconds. In a development based on the foregoing principles, two materials are deposited on the belt in succession. On re-vaporization at the final deposition location, the two materials mix. This takes place predominantly in the vapor phase, immediately before deposition onto the substrate. The mixture is formed and deposited in constant, stoichiometric proportions. The material vaporized is organic. A metal is vaporized. The length of the first vaporization unit is proportional to the layer thickness of material deposited onto the belt. A continuous steel belt is used; it is 10-500 mu m thick. Alternatively a rotary quartz disc coated with silicon carbide to a thickness of 2-100 mu m is used as the carrier. The rotary disc is alternatively made from a material of low relative magnetic permeability. A layer with high relative magnetic permeability is coated onto the surface facing the first vaporization unit. The spacing between substrate and intermediate carrier is less than 50 mm, preferably less than 5 mm. The final heater (7) is a laser source, an induction heater or an electron beam source. An independent claim IS INCLUDED FOR corresponding vacuum-deposition equipment.
机译:将要沉积的材料(4)蒸发两次。第一单元(2)在靠近可移动中间载体(5)的第一位置(3)处蒸发材料。该材料被沉积到载体上,对其进行涂覆。将涂覆的载体移动到靠近要涂覆的基底(8)的第二位置(6)。在此,载体上的材料再次蒸发并沉积在基材上。中间载体是连续带或转盘。在第一蒸发单元附近将其冷却(9)。载体另一侧的加热器(7)在0.001-10秒的间隔内进行第二次蒸发。在基于前述原理的开发中,两种材料相继沉积在带上。在最终沉积位置再次蒸发时,两种材料混合。这主要发生在气相中,紧接在沉积到基材上之前。形成并以恒定的化学计量比例沉积混合物。蒸发的物质是有机的。金属蒸发。第一汽化单元的长度与沉积在带上的材料的层厚度成比例。使用连续钢带;它的厚度为10-500微米。或者,将涂覆有碳化硅的厚度为2-100μm的旋转石英盘用作载体。可选地,转盘由相对磁导率低的材料制成。具有较高相对磁导率的层被涂覆在面对第一汽化单元的表面上。基材和中间载体之间的间隔小于50mm,优选小于5mm。最终加热器(7)是激光源,感应加热器或电子束源。对于相应的真空沉积设备包括独立权利要求。

著录项

  • 公开/公告号DE102009007587A1

    专利类型

  • 公开/公告日2009-11-26

    原文格式PDF

  • 申请/专利权人 VON ARDENNE ANLAGENTECHNIK GMBH;

    申请/专利号DE20091007587

  • 发明设计人 GROSS HARALD;

    申请日2009-02-05

  • 分类号C23C14/24;C23C14/12;

  • 国家 DE

  • 入库时间 2022-08-21 18:28:24

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