首页> 外国专利> HEATER, CRYSTAL GROWING DEVICE AND METHOD FOR PRODUCING COMPOUND SEMICONDUCTOR SINGLE CRYSTAL

HEATER, CRYSTAL GROWING DEVICE AND METHOD FOR PRODUCING COMPOUND SEMICONDUCTOR SINGLE CRYSTAL

机译:加热器,晶体生长设备和复合半导体单晶体的生产方法

摘要

PROBLEM TO BE SOLVED: To provide a heater, a crystal growing device and a method for producing a compound semiconductor single crystal, by which the production yield and uniformity in a plane of a wafer prepared from an obtained crystal can be improved in the production of a compound semiconductor single crystal such as ZnTe.;SOLUTION: The heater 10 includes a cylindrical heat generating unit 101 generating heat by resistive heating, and legs 102 protruding at two opposing positions from each other in a lower part on an outer circumference of the heat generating unit 101, wherein the leg 102 is composed of a terminal 102a where an electrode rod is connected and a connecting part 102b connecting the terminal 102a to the heat generating unit, and the connecting part 102b is formed with the thickness of not more than 10 mm and width of not more than 20 mm.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:提供一种加热器,一种晶体生长装置和一种用于制造化合物半导体单晶的方法,通过该加热器,一种晶体生长装置和一种用于制造化合物半导体单晶的方法,通过该加热器,一种晶体生长装置和一种方法,可以提高由所获得的晶体制成的晶片的产率和平面内的均匀性。解决方案:加热器10包括:圆柱形的发热单元101,其通过电阻加热产生热量;以及支脚102,其在热量的外圆周的下部在彼此相对的两个位置处突出。发热单元101,其中,支脚102由连接有电极棒的端子102a和将端子102a连接至发热单元的连接部102b构成,该连接部102b的厚度为10mm以下。毫米,宽度不超过20毫米。;版权所有:(C)2012,日本特许经营&INPIT

著录项

  • 公开/公告号JP2011213503A

    专利类型

  • 公开/公告日2011-10-27

    原文格式PDF

  • 申请/专利权人 JX NIPPON MINING & METALS CORP;

    申请/专利号JP20100081035

  • 发明设计人 SHIMIZU TAKAYUKI;

    申请日2010-03-31

  • 分类号C30B15/14;H05B3/02;H05B3/03;H05B3/14;C30B27/02;

  • 国家 JP

  • 入库时间 2022-08-21 18:25:42

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