首页> 外国专利> METHOD FOR PRODUCING POLYCRYSTALLINE SILICON, APPARATUS FOR PRODUCING POLYCRYSTALLINE SILICON, AND POLYCRYSTALLINE SILICON

METHOD FOR PRODUCING POLYCRYSTALLINE SILICON, APPARATUS FOR PRODUCING POLYCRYSTALLINE SILICON, AND POLYCRYSTALLINE SILICON

机译:结晶硅的制造方法,结晶硅的制造装置以及结晶硅

摘要

PPROBLEM TO BE SOLVED: To make a silicon rod grow to thereby have a large diameter with a high growth rate and a high yield under the condition where a large amount of raw material is supplied at a high pressure while preventing the blowout of the rod. PSOLUTION: A method for producing polycrystalline silicon comprises supplying electric current to a silicon core rod in a reactor to make the silicon core rod to generate heat, supplying raw material gas including chlorosilanes to the silicon core rod, and depositing polycrystalline silicon on a surface of the silicon core rod to be grown as a rod, wherein the method comprises a first process and a second process, in the first process, a surface temperature is maintained at a predetermined range by adjusting the current value to the silicon core rod, and the raw material gas is supplied while maintaining a supply amount of chlorosilanes per square millimeter of the surface of the rod in a predetermined range until a temperature of the center portion of the rod reaches a predetermined temperature lower than the melting point of the silicon, and in the second process, a previously determined current value is set corresponding to a rod diameter and the supply amount of the raw material gas per square millimeter of the surface of the rod is decreased to maintain the surface temperature and the temperature of the center portion of the rod at predetermined ranges, under the condition where a large amount of raw material gas is supplied at a high pressure. PCOPYRIGHT: (C)2011,JPO&INPIT
机译:

要解决的问题:为了使硅棒生长,从而在防止高压吹出的同时,在高压下供给大量原材料的条件下,以高的生长速率和高的产率使其具有较大的直径。杆。

解决方案:一种生产多晶硅的方法,包括向反应器中的硅芯棒供应电流以使硅芯棒产生热量,向硅芯棒供应包括氯硅烷的原料气体,以及在其上沉积多晶硅。硅芯棒的要生长成棒的表面,其中该方法包括第一工艺和第二工艺,在第一工艺中,通过调节硅芯棒的电流值,将表面温度保持在预定范围内并且,在将棒状表面的每平方毫米的氯硅烷的供给量维持在预定范围内的同时供给原料气体,直到棒状部的中心部分的温度达到低于硅的熔点的预定温度为止。并且,在第二工序中,与棒直径和原料的供给量相对应地设定预先决定的电流值。在高压下供给大量原料气体的条件下,降低棒表面每平方毫米的气体以将表面温度和棒中心部分的温度维持在预定范围内。

版权:(C)2011,日本特许厅&INPIT

著录项

  • 公开/公告号JP2011037699A

    专利类型

  • 公开/公告日2011-02-24

    原文格式PDF

  • 申请/专利权人 MITSUBISHI MATERIALS CORP;

    申请/专利号JP20100160105

  • 发明设计人 URUSHIBARA MAKOTO;MIZUSHIMA KAZUKI;

    申请日2010-07-14

  • 分类号C01B33/035;

  • 国家 JP

  • 入库时间 2022-08-21 18:24:02

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