首页> 外国专利> REACTION FURNACE FOR PRODUCING POLYCRYSTALLINE SILICON, APPARATUS FOR PRODUCING POLYCRYSTALLINE SILICON, METHOD FOR PRODUCING POLYCRYSTALLINE SILICON, AND, POLYCRYSTALLINE SILICON ROD OR POLYCRYSTALLINE SILICON INGOT

REACTION FURNACE FOR PRODUCING POLYCRYSTALLINE SILICON, APPARATUS FOR PRODUCING POLYCRYSTALLINE SILICON, METHOD FOR PRODUCING POLYCRYSTALLINE SILICON, AND, POLYCRYSTALLINE SILICON ROD OR POLYCRYSTALLINE SILICON INGOT

机译:用于生产多晶硅的反应炉,生产多晶硅的装置,生产多晶硅的方法,以及多晶硅棒或多晶硅锭

摘要

A reaction furnace for producing a polycrystalline silicon according to the present invention is designed so as to have an in-furnace reaction space in which a reaction space cross-sectional area ratio (S = [S 0 -S R ]/S R ) satisfies 2.5 or more, which is defined by an inner cross-sectional area (So) of a reaction furnace, which is perpendicular to a straight body portion of the reaction furnace, and a total sum (S R ) of cross-sectional areas of polycrystalline silicon rods that are grown by precipitation of polycrystalline silicon, in a case where a diameter of the polycrystalline silicon rod is 140 mm or more. Such a reaction furnace has a sufficient in-furnace reaction space even when the diameter of the polycrystalline silicon rod has been expanded, and accordingly an appropriate circulation of a gas in the reaction furnace is kept.
机译:用于制造根据本发明的多晶硅的反应炉的设计成具有内炉反应空间,其中反应空间横截面积比(S = [S 0 -SR] / SR)满足2.5或 更多,其由反应炉的内横截面积(SO)限定,所述反应炉垂直于反应炉的直的主体部分,以及多晶硅棒的横截面积的总和(SR) 在多晶硅棒的直径为140mm或更大的情况下,通过沉淀多晶硅的沉淀。 即使当多晶硅棒的直径膨胀,这种反应炉也具有足够的炉内反应空间,并且因此保持反应炉中的气体的适当循环。

著录项

  • 公开/公告号EP3190086B1

    专利类型

  • 公开/公告日2022-01-12

    原文格式PDF

  • 申请/专利权人

    申请/专利号EP20150838723

  • 申请日2015-07-29

  • 分类号C01B33/035;

  • 国家 EP

  • 入库时间 2022-08-24 23:19:58

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