EXPOSURE PROCESSING METHOD, EXPOSURE DEVICE USING THE SAME, EXPOSURE PROCESSING SYSTEM, METHOD FOR MANUFACTURING DEVICE, INFORMATION PROCESSOR AND EXPOSURE PROCESSING PROGRAM

摘要

PROBLEM TO BE SOLVED: To calculate the synchronising accuracy of a shot region on a substrate in both scan directions without interrupting a scanning/exposing processing.;SOLUTION: An exposure processing method in which a plurality of regions configuring an array defined on a substrate is exposed by synchronously moving a reticle stage holding an original plate and a wafer stage holding a substrate in a predetermined scanning direction, includes an extracting step S1 for extracting device information to be obtained through an exposure processing in a plurality of regions; and a calculating step S4, S5 for calculating interpolating value for interpolating device information in a region synchronously moved in a second scanning direction based on device information in a region synchronously moved in a first scanning direction.;COPYRIGHT: (C)2011,JPO&INPIT