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DRY CHAMBER AND DRY CHAMBER SYSTEM USING THE SAME

机译:干腔和干腔系统使用相同的功能

摘要

PPROBLEM TO BE SOLVED: To provide a dry chamber capable of keeping only a necessary part of a work area as an area of a prescribed low dew point, and further improving a degree of freedom in work inside thereof, and superior in the replacement performance of a manufacturing line. PSOLUTION: The drying chamber is composed of a casing 20 having an opening 20a, a dry air supply piping system 14, a dry air recovery piping system 16, an upper flap 34 for opening and closing an upper side of the opening 20a, and a lower flap 38 for opening and closing a lower side of the opening 20a, the upper flap 34 is composed of a front plate 34a and a back plate 34b disposed at a back side of the front plate 34a at an interval, and dry air d supplied to a vent layer 34c formed between the front plate 34a and the back plate 34b flows down as an air curtain from a dry air supply opening 34e formed on a lower end face. PCOPYRIGHT: (C)2011,JPO&INPIT
机译:

要解决的问题:提供一种干燥室,该干燥室仅能够将工作区域的必要部分保持为规定的低露点的面积,并且进一步提高了其内部的工作自由度,并且该干室的优越性在于:生产线的替代性能。解决方案:干燥室由具有开口20a的壳体20,干燥空气供应管道系统14,干燥空气回收管道系统16,用于打开和关闭开口20a的上侧的上挡板34组成。上折板34和用于打开和关闭开口20a的下侧的下折板38,由前板34a和间隔开地设置在前板34a的后侧的后板34b组成。供应到形成在前板34a和后板34b之间的通风层34c的空气d作为气帘从形成在下端面上的干燥空气供应开口34e向下流动。

版权:(C)2011,日本特许厅&INPIT

著录项

  • 公开/公告号JP2011021769A

    专利类型

  • 公开/公告日2011-02-03

    原文格式PDF

  • 申请/专利权人 OMC CO LTD;

    申请/专利号JP20090164895

  • 发明设计人 ITAHANA ISAO;WATANABE SHINJI;

    申请日2009-07-13

  • 分类号F24F3/14;F24F9;H01G13;H01M10/058;

  • 国家 JP

  • 入库时间 2022-08-21 18:22:48

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