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Method of forming the amorphous carbon film amorphous carbon, and amorphous carbon coating member

机译:形成非晶碳膜的方法非晶碳和非晶碳涂层构件

摘要

To provide a soft amorphous carbon exhibiting a low elastic modulus, an amorphous-carbon coated member provided with a coated film comprising the amorphous carbon, and a process for forming an amorphous carbon film. The amorphous carbon comprises carbon as a major component and hydrogen in an amount of from more than 30 atomic % to 60 atomic % or less, and exhibits an elastic modulus of from 40 or more to 150 GPa or less. Moreover, the amorphous-carbon coated member comprises a conductive substrate, and a coated film fixed on at least a part of a surface of the substrate and composed of the amorphous carbon. In addition, in a process for forming the amorphous-carbon coated film, an amorphous carbon film is formed on a surface of conductive substrates by a plasma CVD method. Not only a plurality of the substrates are disposed on a substrate holder, which is disposed in a film-forming furnace and is connected with a negative electrode, in such a state that they face to each other, but also a processing gas pressure and a plasma power source are operated so as to overlap negative glows of the neighboring two substrates.
机译:为了提供具有低弹性模量的软质无定形碳,提供一种具有包含该无定形碳的涂膜的无定形碳涂膜构件以及形成无定形碳膜的方法。非晶碳包括作为主要成分的碳和大于30原子%至60原子%以下的氢,并且表现出大于或等于40GPa至150GPa或更低的弹性模量。此外,无定形碳涂覆构件包括导电基底和固定在该基底的表面的至少一部分上并由无定形碳构成的涂覆膜。另外,在形成非晶碳涂覆膜的过程中,通过等离子体CVD法在导电基板的表面上形成非晶碳膜。不仅将多个基板以彼此面对的状态设置在设置在成膜炉中并与负极连接的基板保持器上,而且还要设置处理气压和压力。等离子电源被操作为与相邻的两个基板的负发光重叠。

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