首页>
外国专利>
And methods of metal polishing CMP process wastewater treatment equipment
And methods of metal polishing CMP process wastewater treatment equipment
展开▼
机译:金属抛光CMP工艺废水处理设备的方法及方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To provide an efficient apparatus for treating waste water from a CMP (chemical mechanical polishing) process, in which an activated carbon treatment unit and a membrane separation unit provided with a separation membrane having specific pore size are arranged so that a high permeation flux can be obtained stably when the waste water from the CMP process is membrane-separated.;SOLUTION: The apparatus for treating waste water from the CMP process includes the activated carbon treatment unit for pretreating the waste water mainly containing the waste water from the CMP process using an acid or neutral polishing liquid and the membrane separation unit provided with the separation membrane (a microfiltration membrane, an ultrafiltration membrane or the like) having 1-1,000 nm pore size for membrane-separating the pretreated water obtained by the activated carbon treatment unit into concentrated water and permeated water. Since the waste water from the CMP process is concentrated and volume-reduced, the clogging frequency of the separation membrane is decreased and the high permeation flux is obtained when the waste water from the CMP process is membrane-separated. As a result, this apparatus can be made compact, the initial cost and running cost of this apparatus can be reduced and the operation of this apparatus can be stabilized.;COPYRIGHT: (C)2008,JPO&INPIT
展开▼