The substrate and the film pattern formation substrate, the thin film transistor formation substrate, the liquid crystal indicating element and that production mannered null semiconductor film

摘要

PROBLEM TO BE SOLVED: To suppress a manufacturing cost of a substrate for forming a film pattern on which there is formed a bank for forming the film pattern on the substrate, and a manufacturing cost of the substrate using the film pattern by filling up and hardening liquid conductive material.;SOLUTION: According to the substrate for forming the film pattern, at least one film member accomplishes the bank. For example, a-Si film 13 and n⁺-type a-Si film 15 accomplish the bank. The film pattern is formed on the substrate by filling up and hardening the liquid conductive material. Accordingly, any process and any member for exclusively forming the bank become unnecessary.;COPYRIGHT: (C)2007,JPO&INPIT